以下为句子列表：
英文: Abstract: A new method for determining proximity parameters α,β,and η in electron-beam lithography is introduced on the assumption that the point exposure spread function is composed of two Gaussians.A single line is used as test pattern to determine prox
中文: 文摘:在电子散射能量沉积为双高斯分布的前提下,提出了一种提取电子束光刻中电子散射参数α,β和η的新方法.该方法使用单线条作为测试图形.为了避免测定光刻胶的显影阈值,在实验数据处理中使用归一化方法.此外,用此方法提取的电子散射参数被成功地用于相同实验条件下的电子束临近效应校正.
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英文: Abstract: Aim at the photocurable sterelithography in which micro-components are made according to point-to-point exposure, the paper describes that this method takes long prototyping time，and it is one of main factors to restrict extension and applicatio
中文: 文摘:采用离散点曝光方式来制作微型构造物的光固化快速成型法，其成型时间长，这一问题是制约微型光固化快速成型技术迅速推广应用的主要因素之一。
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英文: Alignment Precision - Displacement of patterns that occurs during the photolithography process.
中文: 套准精度-在光刻工艺中转移图形的精度。
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英文: Although the creation of a finely detailed bas-relief master is expensive because it requires electron-beam lithography or other advanced techniques, copying the pattern on PDMS stamps is cheap and easy.
中文: 虽然得花上大笔金钱，才能以电子束蚀刻或其他高阶技术制作出有精密细节的浅浮雕主片，但要复制PDMS压模的图案却是便宜又容易。
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英文: But because conventional photolithography becomes more difficult as the dimensions of the structures become smaller, manufacturers are exploring alternative technologies for making future nanochips.
中文: 但由于结构变得更小后，传统的光蚀刻法变得更难做，因此业者正在找寻其他技术，以做出未来的奈米晶片。
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