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photolithography
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影印石版术,照相平版
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详细解释：
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以下为句子列表：
英文: Alignment Precision - Displacement of patterns that occurs during the photolithography process.
中文: 套准精度-在光刻工艺中转移图形的精度。
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英文: But because conventional photolithography becomes more difficult as the dimensions of the structures become smaller, manufacturers are exploring alternative technologies for making future nanochips.
中文: 但由于结构变得更小后，传统的光蚀刻法变得更难做，因此业者正在找寻其他技术，以做出未来的奈米晶片。
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英文: Due to the high costs of wafer materials and machines, it is feasible to apply rework to increase wafer yield at the photolithography stage.
中文: 摘要在晶圆制造中，由于晶圆的原料及机台成本昂贵，为了能够增加晶圆的良率，利用再加工的方式来补救不良的晶圆为可行的措施。
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英文: In order to find the best fabrication control combination, this paper studied rework strategies to be applied in coordination with some commonly used dispatching rules at the photolithography stage.
中文: 本文讨论在微影黄光区中几种再加工策略，并与常用的派工法则配合，期找出最适的生产控制组合。
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英文: Photolithography then reduces the size of the pattern in a process analogous to that used in a photographic darkroom [see illustration on opposite page].
中文: 接著，光蚀刻法用一种类似照相暗房中进行的过程（见右页图），把图案的尺寸缩小。
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