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Developing symmetrically about a central point.
中文意思:
对称发展的在一个中心点周围对称发展的


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Developing regional agricultural circulation economy which is in accordance with the requirement of the new socialist countryside is beneficial to solving peasant problems protecting country ecological environment and realizing agricultural sustainable de 摘要发展农业循环经济,是与社会主义新农村建设要求相一致的,是解决“三农”问题,保护农村生态环境,实现农业可持续发展的必然选择。
Developing self-awareness: Managers must explore ways of managing themselves effectively before trying to manage others. 认识自我:管理者必须了解如何能有效自律,之后方可律人。
Developing straegy research industry planning;project evaluation and project consulting &design in Non-metallic minerals such as graphite,kaolin,talc,attapulgite,bentonite,sillimanite gypsum etc. 对石墨、高岭土、云母、滑石凹凸棒土、膨润土、硅成石、石膏等非金属矿发展战略研究,行业规划。工程项目评估工程设计,技术咨询。
Developing strategic community partnerships, particularly with other entrepreneur assistance organizations, helps ensure an incubator's success. 发展中的战略合作伙伴,特别是企业家协会,将帮助孵化器成功。
Developing students' non-intelligence factors, or advocating quality-oriented education, is a byword of current educational thinking. 培养学生的非智力因素,提倡素质教育,体现了当代的教育思想。
Developing symmetrically about a central point. 对称发展的在一个中心点周围对称发展的
Developing the Amway business is a process whereby you constantly grow and change to become a better person. 做安利是一个不断学习,不断改变自己的过程。
Developing the PC, a classic disruptive technology, simply made no sense for minicomputer makers. 开发个人电脑(典型的颠覆性技术)对于小型机制造商来说简直一点意义也没有。
Developing the advanced products constantly, the loyal city serves the masses of users. 不断开发先进产品,忠诚为广大用户服务。
Developing the exemplary vocational colleges is the significant initiative to improve the level of school-running in vocational colleges. 摘要示范性高等职业院校建设是提升高等职业教育办学水平的重要举措。
Developing the lithography process models to properly characterize critical dimension (CD) variations caused by proximity effects and distortions introduced by patterning tool, reticule, resist exposure, development and etching, they are beneficial to dev 建立准确描述由于掩模制造工艺、光刻胶曝光、显影、蚀刻所引起的光学邻近效应和畸变所导致的关键尺寸变化的光刻工艺模型,有助于开发由成品率驱动的版图设计工具,自动地实现深亚微米下半导体制造中先进的掩模设计、验证和检查等任务。
 
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